Ch. Ehrlich: search on Z-Library

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1

TiN diffusion barriers for copper metallization

J. Baumann, T. Werner, A. Ehrlich, M. Rennau, Ch. Kaufmann, T. Gessner

Journal:

Microelectronic Engineering

Year:

1997

Language:

english

File:

PDF, 457 KB

english, 1997

2

State of the art of pattern placement accuracy of silicon X-ray master masks

S. Pongratz, U. Mescheder, Ch. Ehrlich, H.-L. Huber, K. Kohlmann, W. Windbracke

Journal:

Microelectronic Engineering

Year:

1989

Language:

english

File:

PDF, 573 KB

english, 1989

3

“Direct write” pattern placement accuracy for E-beam nanolithography

K. Reimer, Ch. Ehrlich, C. Köhler, W. Brünger

Journal:

Microelectronic Engineering

Year:

1994

Language:

english

File:

PDF, 330 KB

english, 1994

4

Cellector: A new software tool for the support of cell projection in combination with variable shape electron beam lithography for mask and direct write applications

H. Hartmann, R. Steinmetz, T. Waas, P. Hahmann, Ch. Ehrlich

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 690 KB

english, 1999

5

Arsen und Antimon

J. Cribier, F. Hefti, C. R. Sanger, O. F. Black, E. Kohn-Abrest, R. M. Chapin, W. D. Treadwell, Ch. Mussler, G. P. Baxter, F. K. Bezzenberger, C. H. Wilson, L. Moser, J. Ehrlich, J. Waddell, J. H. Mül

Journal:

Analytical and Bioanalytical Chemistry

Year:

1924-1925

Language:

german

File:

PDF, 677 KB

german, 1924-1925

6

Luminescence of Cd1−xMnxS within the concentration range 0.0001 ⩽ x ⩽ 0.28

Ch. Ehrlich, W. Busse, H.-E. Gumlich, D. Tschierse

Journal:

Journal of Crystal Growth

Year:

1985

Language:

english

File:

PDF, 319 KB

english, 1985

7

E-beam written optically transparent x-ray masks: Four levels for an industrial VLSI chip with megabit design rules

Ch. Ehrlich, B. Breithaupt, R. Demmeler, E.P. Jacobs, C. Köhler, K. Kohlmann, M. Petschner, K. Reimer

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 332 KB

english, 1992

8

W/TiN double layers as barrier system for use in Cu metallization

J. Baumann, M. Markert, T. Werner, A. Ehrlich, M. Rennau, Ch. Kaufmann, T. Gessner

Journal:

Microelectronic Engineering

Year:

1997

Language:

english

File:

PDF, 442 KB

english, 1997

9

High resolution e-beam lithography for X-ray mask making

S. Pongratz, K. Reimer, R. Demmeler, Ch. Ehrlich

Journal:

Microelectronic Engineering

Year:

1987

Language:

english

File:

PDF, 314 KB

english, 1987

10

Wein

L. Semichon, M. Flanzy, F. Ehrlich, E. Schowalter, J. Dubaqnié, C. A. Grau, G. Bonifazi, J. Estalella, Ch. Lagneau, P. Balavoine, A. Widmer, Ph. Malvezin, O. Reichard, G. Filaudeau, H. Boßelmann, C. v

Journal:

Analytical and Bioanalytical Chemistry

Year:

1928

Language:

german

File:

PDF, 482 KB

german, 1928

11

Automated enzyme-linked immunoassays for the detection of HBsAg, anti-HBs, anti-HBc and anti-HBc IgM

Ehrlich-Weinreich, G., Kessler, A.-Ch., Ebert, Ch., Melchior, W., Bayer, H.

Journal:

Journal of Hepatology

Year:

1990

Language:

english

File:

PDF, 105 KB

english, 1990

12

Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks

C. Köhler, W. Brünger, Ch. Ehrlich, H. Huber, K. Reimer

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 402 KB

english, 1993

13

WePrint 200 — The fast e-beam printer with high throughput

O. Fortagne, P. Hahmann, Ch. Ehrlich

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 810 KB

english, 1995

14

HER-2 Amplification but Not Butyrylcholinesterase Mutability Reflects Aggressiveness of European-Originated Ovarian Tumors

K. Dobianer, Ch. Hruza, G. Ehrlich, P. Sevelda, K. Czerwenka, H. Soreq, J. Spona, H. Zakut

Journal:

Gynecologic Oncology

Year:

1995

File:

PDF, 425 KB

1995

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